UV radiation enhanced oxygen vacancy formation caused by the PLD plasma plume
- Submitting institution
-
University of Dundee
- Unit of assessment
- 12 - Engineering
- Output identifier
- 34181810
- Type
- D - Journal article
- DOI
-
10.1038/s41598-018-27207-5
- Title of journal
- Scientific Reports
- Article number
- 8846
- First page
- 1
- Volume
- 8
- Issue
- 1
- ISSN
- 2045-2322
- Open access status
- Compliant
- Month of publication
- June
- Year of publication
- 2018
- URL
-
-
- Supplementary information
-
-
- Request cross-referral to
- -
- Output has been delayed by COVID-19
- No
- COVID-19 affected output statement
- -
- Forensic science
- No
- Criminology
- No
- Interdisciplinary
- No
- Number of additional authors
-
9
- Research group(s)
-
-
- Proposed double-weighted
- No
- Reserve for an output with double weighting
- No
- Additional information
- UV emitted by the PLD plume changes near surface vacancy defects, even in the oxide substrate during epitaxial growth. An invitation to join the EU-COST “Towards Oxide Based Electronics” (MP1308) and to participation in the proposal COST Proposal OC-2020-1-24657 "European Network for Innovative and Advanced Epitaxy” resulted. A new collaboration with Schlom group (Cornell) which has resulted in Appl. Phys. Lett. 117 062901 with further work preparation. Work featured in three invited talks at Towards Oxide-Based Electronics, Sant-Feliu-Gulxols 13/03/18, 18th International Conference on Positron Annihilation, Orlando, 21/09/18 and 15th International Workshop on Slow Positron Beam Techniques and Applications, Prague, 05/09/19.
- Author contribution statement
- -
- Non-English
- No
- English abstract
- -