A Rapid Photopatterning Method for Selective Plating of 2D and 3D Microcircuitry on Polyetherimide
- Submitting institution
-
Heriot-Watt University
(joint submission with University of Edinburgh)
- Unit of assessment
- 12 - Engineering
- Output identifier
- 24448386
- Type
- D - Journal article
- DOI
-
10.1002/adfm.201704451
- Title of journal
- Advanced Functional Materials
- Article number
- 1704451
- First page
- -
- Volume
- 28
- Issue
- 6
- ISSN
- 1616-301X
- Open access status
- Compliant
- Month of publication
- December
- Year of publication
- 2017
- URL
-
-
- Supplementary information
-
-
- Request cross-referral to
- -
- Output has been delayed by COVID-19
- No
- COVID-19 affected output statement
- -
- Forensic science
- No
- Criminology
- No
- Interdisciplinary
- No
- Number of additional authors
-
8
- Research group(s)
-
-
- Proposed double-weighted
- No
- Reserve for an output with double weighting
- No
- Additional information
- The paper presents a new approach for producing metallic micro-tracks by direct light writing on polyetherimide, useful for both flexible substrates for microelectronics and on 3D printed samples. The paper describes a route to speed up the photo-patterning reaction at speed competitive for production. The paper was highlighted on the journal cover (Adv. Funct. Mater. Issue 6/2018, DOI: 10.1002/adfm.201870041). It has generated a new industrial project funded by the British company Renishaw (£32K) to implement the method [Contact: Manager (Edinburgh), Renishaw].
- Author contribution statement
- -
- Non-English
- No
- English abstract
- -
