Plasma Jet Printing and in Situ Reduction of Highly Acidic Graphene Oxide
- Submitting institution
-
The Open University
- Unit of assessment
- 12 - Engineering
- Output identifier
- 1455882
- Type
- D - Journal article
- DOI
-
10.1021/acsnano.8b00903
- Title of journal
- ACS Nano
- Article number
- -
- First page
- 5473
- Volume
- 12
- Issue
- 6
- ISSN
- 1936-0851
- Open access status
- Compliant
- Month of publication
- May
- Year of publication
- 2018
- URL
-
-
- Supplementary information
-
-
- Request cross-referral to
- -
- Output has been delayed by COVID-19
- No
- COVID-19 affected output statement
- -
- Forensic science
- No
- Criminology
- No
- Interdisciplinary
- No
- Number of additional authors
-
5
- Research group(s)
-
-
- Proposed double-weighted
- No
- Reserve for an output with double weighting
- No
- Additional information
- This article reports an original and innovative low-cost approach to print Graphene oxide (GO) films from highly acidic suspensions with in situ reduction using an atmospheric pressure plasma jet. This technique addresses the challenge of printing materials without heating any substrates and overcomes the multiple intermediate steps required to increase the conductivity of deposited GO. The findings are significant for advancing miniaturisation of electronic devices to develop technologies for patterned deposition of functional nanomaterials. The outcome of this paper resulted in engagement with Lohmann Technologies and Bank of England.
- Author contribution statement
- -
- Non-English
- No
- English abstract
- -
